ASI Vapor Axial Deposition (VAD 1.01) is capable of depositing germanium doped silica soot vertically at atmospheric environment. The system is used to fabricate single- mode optical fiber c
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ACD Dual Spindle Atmospheric Vapor Deposition System
ASI Atmospheric Vapor Deposition System (CD 2.01)is capable of depositing germanium doped silica soot at high speed. The system can product two core preforms at the same time.